generation and measurement of sub-micrometer relativistic electron beams

by:Sinowon     2020-01-29
Low generation
In recent years, electron beam has aroused great interest.
Driven by X-demandray-
Free electron laser, with the increase of beam brightness, the emission degree of photoelectric cathode injector is significantly reduced.
This puts forward more and more strict requirements for instruments measuring beam size.
These requirements are more stringent for the development of new accelerators, such as laser-
A driving accelerator based on a dielectric structure or plasma.
We introduced a son here.
Electron beam at micron level, with particle energy of 30 mev, has a charge below 1 pc. An electron-
Beam Optics with vertical β-
The function of several millimeters is set.
The beam is characterized by a wire scanner that uses a 1 μm wide metal structure made using electronics
Beam exposureThe smallest (rms)
The lateral beam size given here is less than 500nm.
Nowadays, scientists are trying to get the extremely small lateral size of the electron beam and emittances, due to the high demand of X-ray-
Free electron laser (XFELs)
And the development of new accelerators.
In linear colliders, one of the main design objectives is to achieve small beam sizes at the point of interaction to maximize luminosity.
For example, the design of the International Linear Collider uses nano
The size beam of the interaction point.
Similar requirements must also be met for advanced accelerator concepts such as dielectric laser accelerators and plasma tail field accelerators.
These schemes take advantage of micron-scale transverse acceleration structures defined by plasma or laser wavelengths and have been shown to achieve a high acceleration gradient.
In the medium laser accelerator, the electron beam is accelerated by requiring the media microstructure of the transverse size of the beam in the submediumμm scale.
In the field of plasma-
Reducing the lateral emission to the nano scale based on acceleration will open the way for many different applications of this technology, such as colliders and light sources.
With regard to XFELs, the reduced beam emission will allow a compact design with lower beam energy and shorter swing length.
For future applications with ultra-low inductance and beam size, special care may be required to avoid the possibility that due to space-
Charge Effect: so-
What is called a layered parameter should remain less than 1 to ensure space that can be ignored-
Contribution of fees.
The challenge of designing an ultra-low emission accelerator brings the need for horizontal beam size diagnosis
Pixel resolution.
However, the resolution limit of the commonly used beam profile monitor hinders the measuring sub
Point size (
Details are provided in the \"discussion).
We have designed a new type of line scanner. WSC)
Have resolution in sub
A thousand-foot range.
In the WSC measurement, the thin metal wire scans the beam horizontally.
Particle showers generated (loss signal)
It is detected downstream so that the lateral profile of the beam can be reconstructed (see ‘Methods’).
The design of the WSC to improve the resolution needs to reduce the width of the wire.
We developed a high
Resolution profile monitor using nano-processing technology to produce 1 μm wide metal stripe on the film by electron
Beam exposure and plating.
The proposed design ensures that
Pixel resolution and ability to integrate wire scannera-chip.
In this paper, we introduce the generation and representation of electron beams with 53 nm normalized emission degrees on the vertical plane, whose particle energy is 30 mev and the beam charge is less than 1 pc.
This nano-emission is in X-ray-
Free electron lasers at the Paul Scherrer Institute.
We achieved points.
Set the size of the electronic ruler
Beam Optics meets 2. 61u2009mm -
Functions on a vertical plane.
Acceleration devices, beam optics and wire scanners described-a-
The chip has enabled the generation and measurement of rms beams (
Root of Squaresizes
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